E-800S - Fully automatic, vacuum load locked, large batch, sputtering system for production applications utilising small substrate sizes.

Equipped with, up to, five 180 mm diameter magnetron sputtering electrodes. Using rotation batch deposition 25 x 75 mm diameter wafers can be coated in a single run.

This system is suited to various applications including the production of MEMS, LEDs and Laser Diodes.

The E-800 series provides high throughput and a low cost of ownership.