E-200S - Very compact semi automatic sputtering system for R&D and lab use.

This entry level system may be provided with or without a vacuum load lock for rapid sample entry and retrieval.

Equipped with, up to, three 50 mm diameter magnetron sputtering electrodes and off-set sample rotation good within sample non-uniformity maybe achieved across a 100 mm diameter area. Larger areas can be coated with reduced levels of uniformity (samples larger than 100 mm diameter may only be manually loaded with an atmospheric chamber cycle).

Standard features also include variable source to substrate separation (50 mm range) a bakeable deposition chamber and substrate heating to 300ºC. This small system is suited to laboratory and research applications for a broad range of thin film applications including both existing and emerging nano technologies.