Ion Beam Systems

Thin film deposition and etch systems for semiconductors (silicon, III-V, II-VI),
magnetic heads and sensors, MEMS, photonics, LEDs, LDs, SAW devices,
microbolometers and other emerging applications within the nano technology arena.


The Nordiko 7000 broad ion beam milling system.


The Nordiko 7500 broad ion beam milling system.


The 3400 is an advanced automatic vacuum coating system


i-Octave multi-target broad ion beam deposition system.


The α120 is a customisable laboratory scale broad ion beam milling system.


Physical Vapour Deposition Systems

This series of capable sputtering systems offers proven flexibility for RD&I and
pilot production applications. Each process module can be configured for stand-
alone operation or integrated with a wafer handling platform and other process
modules in a cluster arrangement.


The Nordiko 2000 / 2550 series, smallest of the batch PVD systems.


The Nordiko 8000 / 8550 series, an enlarged version of the 2000.


The Nordiko 9000 / 9550 series largest PVD system suited to 150mm substrates.


The Nordiko 5000
configurable process
module.


Click images for detailed information.