Thin film deposition and etch systems for semiconductors (silicon, III-V, II-VI), magnetic heads and sensors, MEMS, photonics, LEDs, LDs, SAW devices,
microbolometers and other emerging applications within the nano technology arena.
The Nordiko Mnem-iX broad ion beam milling system.
The Nordiko 7500 broad ion beam milling system.
The 3400 is an advanced automatic vacuum coating system
i-Octave multi-target broad ion beam deposition system.
The α120 is a customisable laboratory scale broad ion beam milling system.
Physical Vapour Deposition Systems
This series of capable sputtering systems offers proven flexibility for RD&I and
pilot production applications. Each process module can be configured for stand-
alone operation or integrated with a wafer handling platform and other process
modules in a cluster arrangement.