Ion Sources
Four sizes of ion source are offered: 10, 15, 20 & 25 cm. All are rf excited at 13.56 MHz and employ an advanced multi-aperture accelerator. Each provides a high level of power efficiency resulting from the innovative design.

The 15 cm source, commonly selected for illumination of a target for deposition, will deliver an ion current exceeding 350 mA with a typical rf input power of less than 200W.

m-Octave
m-octave from NTSL is an automated multi-target physical vapour deposition system aimed at laboratory and development applications.  Building on our experience gained over 20 years in making deposition systems this configuration combines simplicity with innovation and is capable of delivering exceptional within wafer non-uniformity. The  system can be equipped with up to eight deposition targets  and can also utilise NTSL ion source technology, for pre-clean and/or surface modification.

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